Equipment

Quanta 3D 200 & Nova Nanolab 200

The Quanta 200 3D and Nova Nanolab 200 are dual beam systems, which integrate an ion and an electron beam for FIB and SEM functionality. Users can switch between the two beams for rapid and accurate navigation and milling processes. Convergence of electron and ion beam at a short working distance allows slice-and-view cross-sectioning in real time, simultaneous patterning and viewing, and sample analysis at high resolution. Immediate electron beam images of cross sections are obtainable without stage motion or sample transfer. Furthermore, instant high-resolution SEM imaging after FIB milling prevents exposure of milled cross-sections to atmospheric contaminants.




	^{Quanta 3D 200 Petite Building, room 160}




	^{Nova Nanolab 200 Petite Building, room 160}

^Stage

Both instruments can accommodate wafers up to 2” or other device platforms in a high-vacuum environment. The high accuracy five-axis stage has a range of 2”, and provides computer control and automation of all directions of movement.

Gas Deposition

Multiple gas injectors can be installed for material deposition in conjunction with either electron or ion beam pattern definition. Electron beam-induced deposition offers the advantage that the the deposited material is not sputtered, and that no gallium ions are implanted.
The Gas Injection System (GIS) also provides enhanced etching capability for high aspect ratio drilling with minimal re-deposition, preferential etching of cross-section surfaces prior to SEM imaging, and rapid milling of TEM sections.
Up to four self-contained GIS beam chemistries can be installed at the workstation, allowing the precursor material to be contained entirely within the vacuum system for simple, flexible, and safe operation.
Currently, our instruments are equipped with platinum deposition GIS.
It should be noted that the Quanta 3D system can be operated in environmental mode at ambient conditions, which is of particular interest for SEM imaging at biological specimen.
System descriptions: (http://www.fei.com/Portals/_default/PDFs/content/2006_06_Quanta200_3DDualBeam_pb.pdf, http://www.fei.com/Portals/_default/PDFs/content/2006_06_Nova200NanoLab_pb.pdf)

	^{Quanta 3D}	^{Nova Nanolab 200}
Electron source	Tungsten Filament	Schottky FEG 500V – 30 KV
Resolution	3.5 nm at 30 KV high vac. < 15 nm at 3KV low vac.	1.1 nm at 15 KV (TLD-SE) 2.5 nm at 1KV (TLD-SE)
Detector	Everhart Thornley SED Gaseous SED (low vac.) Gaseous BSED (ESEM mode)	Everhart Thornley SED in-lens SE detector (TLD-SE) in-lens BSE detector (TLD-BSE) CDEM (channel detection multiplier SE and SI)
Ion Source	Magnum Ion column with Ga liquid ion source	Magnum Ion column with Ga liquid ion source
Beam current	1 pA - 20 nA	1pA - 20 nA
Resolution	12nm @ 30kV @ 1pA	7nm @ 30kV @ 1pA
GIS	Platinum deposition	Platinum deposition
Chamber	Eucentric height: 15 mm angle ebeam/ionbeam: 52°	Eucentric height: 15 mm angle ebeam/ionbeam: 52°
Other features	ESEM capability	Kleindiek Micromanipulator